The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Jul. 27, 2010
Applicants:
Rajesh Odedra, Victoria, CA;
Neil Boag, Mytholmroyd W. Yorkshire, GB;
Jeff Anthis, San Jose, CA (US);
Ravi Kanjolia, North Andover, MA (US);
Inventors:
Rajesh Odedra, Victoria, CA;
Neil Boag, Mytholmroyd W. Yorkshire, GB;
Jeff Anthis, San Jose, CA (US);
Ravi Kanjolia, North Andover, MA (US);
Assignee:
Sigma-Aldrich Co. LLC, St. Louis, MO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C07F 15/00 (2006.01); C07F 15/06 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 15/06 (2013.01); C23C 16/406 (2013.01); C23C 16/45553 (2013.01);
Abstract
A method for forming a cobalt-containing thin film by a vapor deposition process is provided. The method comprises using at least one precursor corresponding in structure to Formula (I); wherein Rand Rare independently C-C-alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.