Location History:
- San Jose, CA (US) (2015)
- Haverhill, MA (US) (2015)
Company Filing History:
Years Active: 2015
Title: Jeff Anthis: Innovator in Dielectric Thin Films
Introduction
Jeff Anthis is a notable inventor based in San Jose, CA, who has made significant contributions to the field of materials science. With a focus on organometallic complexes, he has developed innovative methods for creating dielectric thin films, which are essential in various electronic applications. His work has led to the granting of two patents, showcasing his expertise and creativity in this specialized area.
Latest Patents
Jeff Anthis holds two recent patents that highlight his innovative approach to thin film technology. The first patent is titled "High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films." This patent describes a method for forming a cobalt-containing thin film through a vapor deposition process, utilizing specific precursors that adhere to a defined structural formula. The second patent, "Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films," focuses on organometallic complexes and their applications in thin film deposition techniques such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD).
Career Highlights
Jeff Anthis is currently employed at Sigma-Aldrich Co. LLC, where he continues to advance his research in the field of materials science. His work at Sigma-Aldrich has allowed him to collaborate with other experts in the industry, further enhancing his contributions to innovative technologies.
Collaborations
Some of Jeff's notable coworkers include Rajesh Odedra and Neil Boag, who have worked alongside him in various projects related to thin film technologies. Their collaborative efforts have played a crucial role in the development of new materials and processes.
Conclusion
In summary, Jeff Anthis is a distinguished inventor whose work in dielectric thin films has led to significant advancements in materials science. His patents reflect his innovative spirit and commitment to pushing the boundaries of technology.