Olov B Karlsson

USPTO Granted Patents = 49 (Patent Applications = 3)

Average Co-Inventor Count = 4.7

ph-index = 13

Forward Citations = 589(Granted Patents)

Company Filing History:

32 out of 12,867

Advanced Micro Devices Corporation

where one patent can have more than one assignee

Years Active: 1999-2016

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49 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9399753 - Aqua regia and hydrogen peroxide HCL combination to remove Ni and NiPt residues (2016-07-26),

2. 9362283 - Gate structures for transistor devices for CMOS applications and products (2016-06-07),

3. 9196475 - Methods for fabricating integrated circuits including fluorine incorporation (2015-11-24),

4. 9105497 - Methods of forming gate structures for transistor devices for CMOS applications (2015-08-11),

5. 9059156 - Method of forming an erbium silicide metal gate stack FinFET device via a physical vapor deposition nanolaminate approach (2015-06-16),

6. 8946015 - Aqua regia and hydrogen peroxide HCI combination to remove Ni and NiPt residues (2015-02-03),

7. 8859431 - Process to remove Ni and Pt residues for NiPtSi application using chlorine gas (2014-10-14),

8. 8854067 - Circular transmission line methods compatible with combinatorial processing of semiconductors (2014-10-07),

9. 8853081 - High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures (2014-10-07),

10. 8809140 - Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues (2014-08-19),

11. 8784572 - Method for cleaning platinum residues on a semiconductor substrate (2014-07-22),

12. 8735302 - High productivity combinatorial oxide terracing and PVD/ALD metal deposition combined with lithography for gate work function extraction (2014-05-27),

13. 8697573 - Process to remove Ni and Pt residues for NiPtSi applications using aqua regia with microwave assisted heating (2014-04-15),

14. 8518765 - Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues (2013-08-27),

15. 8513117 - Process to remove Ni and Pt residues for NiPtSi applications (2013-08-20),

Title: Olov B Karlsson: Innovator in Semiconductor Technology

Introduction

Olov B Karlsson, based in San Jose, CA, is a prolific inventor in the field of semiconductor technology, holding an impressive total of 49 patents. His contributions have significantly advanced the cleaning processes and materials used in semiconductor manufacturing, showcasing his expertise and innovative spirit in the industry.

Latest Patents

Among his most recent innovations are two notable patents. The first is a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process, utilizing a combination of aqua regia and hydrochloric acid with hydrogen peroxide. This multi-step residue cleaning improves the solubility of remaining platinum residues, facilitating their removal and enhancing substrate quality.

The second patent involves gate structures for transistor devices tailored for CMOS applications. This integrated circuit includes detailed specifications for NMOS and PMOS transistors, highlighting the design of gate insulation layers and metal silicide materials. This innovation addresses critical performance needs in modern semiconductor devices.

Career Highlights

Olov has made significant contributions while working at various esteemed companies, including Advanced Micro Devices Corporation and Intermolecular, Inc. His work has placed him at the forefront of technological advancements in semiconductor fabrication, enabling better device performance and efficiency.

Collaborations

Throughout his career, Olov has collaborated with notable professionals in the field, including Christopher F Lyons and Nick Kepler. These partnerships have helped foster an environment of innovation and creativity, enabling the development of groundbreaking technologies.

Conclusion

Olov B Karlsson stands out as a key figure in semiconductor technology innovation. His extensive patent portfolio reflects his commitment to improving processes and materials in semiconductor manufacturing. As technology continues to evolve, his contributions will undoubtedly play a vital role in shaping the future of the industry.

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3 patents pending:

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