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For the Inventor, By the Inventor

San Jose, CA, United States of America

Olov B Karlsson

This inventor holds 49 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Fabrication. Top assignees: Advanced Micro Devices Corporation, Intermolecular, Inc., Globalfoundries Inc.. Active years: 1999-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olov B Karlsson. Retrieved from https://idiyas.com/inventor/olov-b-karlsson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 49 

% Patents Active = 67.3

Average Co-Inventor Count = 4.7

ph-index = 13

Forward Citations = 590(Granted Patents)


Company Filing History:

goldMedal32 out of 13,168 
 
Advanced Micro Devices Corporation
 patents
silverMedal14 out of 726 
 
Intermolecular, Inc.
 patents
bronzeMedal9 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 1 out of 1,075 
 
Spansion LLC.
 patents
where one patent can have more than one assignee

Years Active: 1999-2016

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Areas of Expertise:
Transistor Devices
CMOS Applications
Gate Structures
Ion Implantation
Shallow Trench Isolation
High-K Dielectric
Silicide Sources
Photoresist Removal
Residue Removal
PVD
ALD
Charge Storage
49 patents (USPTO):Explore Patents
1. 9399753 - Aqua regia and hydrogen peroxide HCL combination to remove Ni and NiPt residues (2016-07-26),
2. 9362283 - Gate structures for transistor devices for CMOS applications and products (2016-06-07),
3. 9196475 - Methods for fabricating integrated circuits including fluorine incorporation (2015-11-24),
4. 9105497 - Methods of forming gate structures for transistor devices for CMOS applications (2015-08-11),
5. 9059156 - Method of forming an erbium silicide metal gate stack FinFET device via a physical vapor deposition nanolaminate approach (2015-06-16),
6. 8946015 - Aqua regia and hydrogen peroxide HCI combination to remove Ni and NiPt residues (2015-02-03),
7. 8859431 - Process to remove Ni and Pt residues for NiPtSi application using chlorine gas (2014-10-14),
8. 8854067 - Circular transmission line methods compatible with combinatorial processing of semiconductors (2014-10-07),
9. 8853081 - High dose ion-implanted photoresist removal using organic solvent and transition metal mixtures (2014-10-07),
10. 8809140 - Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues (2014-08-19),
11. 8784572 - Method for cleaning platinum residues on a semiconductor substrate (2014-07-22),
12. 8735302 - High productivity combinatorial oxide terracing and PVD/ALD metal deposition combined with lithography for gate work function extraction (2014-05-27),
13. 8697573 - Process to remove Ni and Pt residues for NiPtSi applications using aqua regia with microwave assisted heating (2014-04-15),
14. 8518765 - Aqua regia and hydrogen peroxide HCl combination to remove Ni and NiPt residues (2013-08-27),
15. 8513117 - Process to remove Ni and Pt residues for NiPtSi applications (2013-08-20),

Title: Olov B Karlsson: Innovator in Semiconductor Technology

Introduction

Olov B Karlsson, based in San Jose, CA, is a prolific inventor in the field of semiconductor technology, holding an impressive total of 49 patents. His contributions have significantly advanced the cleaning processes and materials used in semiconductor manufacturing, showcasing his expertise and innovative spirit in the industry.

Latest Patents

Among his most recent innovations are two notable patents. The first is a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process, utilizing a combination of aqua regia and hydrochloric acid with hydrogen peroxide. This multi-step residue cleaning improves the solubility of remaining platinum residues, facilitating their removal and enhancing substrate quality.

The second patent involves gate structures for transistor devices tailored for CMOS applications. This integrated circuit includes detailed specifications for NMOS and PMOS transistors, highlighting the design of gate insulation layers and metal silicide materials. This innovation addresses critical performance needs in modern semiconductor devices.

Career Highlights

Olov has made significant contributions while working at various esteemed companies, including Advanced Micro Devices Corporation and Intermolecular, Inc. His work has placed him at the forefront of technological advancements in semiconductor fabrication, enabling better device performance and efficiency.

Collaborations

Throughout his career, Olov has collaborated with notable professionals in the field, including Christopher F Lyons and Nick Kepler. These partnerships have helped foster an environment of innovation and creativity, enabling the development of groundbreaking technologies.

Conclusion

Olov B Karlsson stands out as a key figure in semiconductor technology innovation. His extensive patent portfolio reflects his commitment to improving processes and materials in semiconductor manufacturing. As technology continues to evolve, his contributions will undoubtedly play a vital role in shaping the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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