The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Jul. 17, 2014
Applicants:
Intermolecular Inc., San Jose, CA (US);
Globalfoundries, Inc., Grand Cayman, KY;
Inventors:
Assignees:
Intermolecular, Inc., San Jose, CA (US);
GLOBALFOUNDRIES, Inc., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 21/324 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02068 (2013.01); H01L 29/66568 (2013.01); H01L 21/28052 (2013.01); H01L 21/324 (2013.01); H01L 29/4975 (2013.01);
Abstract
A method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process is disclosed, including a multi-step residue cleaning, including exposing the substrate to an aqua regia solution, followed by an exposure to a solution having hydrochloric acid and hydrogen peroxide. The SC2 solution can further react with remaining platinum residues, rendering it more soluble in an aqueous solution and thereby dissolving it from the surface of the substrate.