The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Nov. 15, 2011
Anh Duong, Fremont, CA (US);
Sean Barstow, San Jose, CA (US);
Clemens Fitz, Dresden, DE;
John Foster, Mountain View, CA (US);
Olov Karlsson, San Jose, CA (US);
Bei LI, Fremont, CA (US);
James Mavrinac, San Jose, CA (US);
Anh Duong, Fremont, CA (US);
Sean Barstow, San Jose, CA (US);
Clemens Fitz, Dresden, DE;
John Foster, Mountain View, CA (US);
Olov Karlsson, San Jose, CA (US);
Bei Li, Fremont, CA (US);
James Mavrinac, San Jose, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process. Embodiments of the invention provide a multi-step cleaning process, comprising exposing the substrate to a nitric acid solution after a first anneal, followed by an aqua regia solution after a second anneal. The substrate can be optionally exposed to a hydrochloric acid solution afterward to completely remove any remaining platinum residues.