James Mavrinac

Title: Innovations by James Mavrinac in Semiconductor Cleaning Processes

Introduction

James Mavrinac is an accomplished inventor based in San Jose, CA, with a focus on semiconductor technology. He holds a total of 4 patents that contribute significantly to the field of semiconductor manufacturing. His work primarily revolves around methods for cleaning residues from semiconductor substrates, which is crucial for ensuring the efficiency and reliability of electronic devices.

Latest Patents

Mavrinac's latest patents include a groundbreaking process to remove nickel (Ni) and platinum (Pt) residues for nickel platinum silicidation applications using chlorine gas. This invention discloses a method for cleaning residues from a semiconductor substrate during the silicidation process. The traditional aqua regia solution, which is a mixture of nitric acid and hydrochloric acid, may not adequately remove post-silicidation residues of nickel and platinum. Therefore, Mavrinac's invention provides a multi-step residue cleaning process. This process involves exposing the substrate to an aqua regia solution, followed by exposure to chlorine gas or a solution containing dissolved chlorine gas. This method enhances the solubility of remaining platinum residues, allowing for more effective removal from the substrate surface.

Another notable patent by Mavrinac is a method for cleaning platinum residues on a semiconductor substrate. This method begins with exposing the surface to a first solution containing a mixture of nitric acid and hydrochloric acid. Subsequently, the surface is treated with a second solution containing hydrochloric acid, ensuring thorough cleaning of platinum residues.

Career Highlights

Throughout his career, Mavrinac has worked with prominent companies in the semiconductor industry, including Intermolecular, Inc. and GlobalFoundries Inc. His contributions to these organizations have been instrumental in advancing semiconductor cleaning technologies.

Collaborations

Mavrinac has collaborated with notable professionals in the field, including Anh Duong and Olov B Karlsson. These collaborations have further enriched his work and contributed to the development of innovative cleaning methods for semiconductor substrates.

Conclusion

James Mavrinac's innovative approaches to cleaning semiconductor substrates have made a significant impact on the industry. His patents reflect a deep understanding of the challenges faced in semiconductor manufacturing and provide effective solutions for improving the cleaning process.