The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Nov. 14, 2011
Anh Duong, Fremont, CA (US);
John Foster, Mountain View, CA (US);
Olov Karlsson, San Jose, CA (US);
James Mavrinac, San Jose, CA (US);
Usha Raghuram, Saratoga, CA (US);
Anh Duong, Fremont, CA (US);
John Foster, Mountain View, CA (US);
Olov Karlsson, San Jose, CA (US);
James Mavrinac, San Jose, CA (US);
Usha Raghuram, Saratoga, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process. Post silicidation residues of nickel and platinum may not be removed adequately just by an aqua regia solution (comprising a mixture of nitric acid and hydrochloric acid). Therefore, embodiments of the invention provide a multi-step residue cleaning, comprising exposing the substrate to an aqua regia solution, followed by an exposure to a chlorine gas or a solution comprising dissolved chlorine gas, which may further react with remaining platinum residues, rendering it more soluble in aqueous solution and thereby dissolving it from the surface of the substrate.