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For the Inventor, By the Inventor

Saitama, Japan

Norio Ishikawa

This inventor holds 39 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Semiconductor Cleaning. Top assignees: Kanto Kagaku Kabushiki Kaisha, Nihon Kohden Corporation, Kabushiki Kaisha Toshiba. Active years: 1990-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norio Ishikawa. Retrieved from https://idiyas.com/inventor/norio-ishikawa-g9dwwsys

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 39 

% Patents Active = 71.8


Average Co-Inventor Count = 3.0

ph-index = 15

Forward Citations = 1,095(Granted Patents)


Location History:

  • Souka, JP (1990)
  • Kawasaki, JP (1999 - 2001)
  • Tokyo, JP (1993 - 2005)
  • Saitama-ken, JP (2000 - 2009)
  • Kasukabe, JP (2004 - 2010)
  • Saitama, JP (2005 - 2012)
  • Soka, JP (1996 - 2013)

Company Filing History:

goldMedal21 out of 103 
 
Kanto Kagaku Kabushiki Kaisha
 patents
silverMedal14 out of 578 
 
Nihon Kohden Corporation
 patents
bronzeMedal4 out of 53,286 
 
Kabushiki Kaisha Toshiba
 patents
4. 4 out of 2,467 
 
Nec Electronics Corporation
 patents
5. 2 out of 36,735 
 
Nec Corporation
 patents
6. 1 out of 1 
 
Hihon Kohden Corporation
 patent
7. 1 out of 6 
 
Kanto Chemical Co., Inc.
 patents
8. 1 out of 1,235 
 
Nissan Chemical Industries Limited
 patents
9. 1 out of 7,659 
 
Renesas Electronics Corporation
 patents
10. 1 out of 8,782 
 
Sanyo Electric Co., Ltd.
 patents
11. 1 out of 58,148 
 
Sony Corporation
 patents
12. 1 out of 1 
 
Toshiaki Yagi
 patent
13. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1990-2013

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Areas of Expertise:
Semiconductor Cleaning
Etching Composition
Photoresist Removal
Cleaning Solution
Substrate Processing
Positive Resist
Chemical Composition
Washing Liquid
Manufacturing Method
Residue Remover
Aqueous Solution
Electronic Materials
39 patents (USPTO):Explore Patents
1. 8513140 - Post-dry etching cleaning liquid composition and process for fabricating semiconductor device (2013-08-20),
2. 8323880 - Positive resist processing liquid composition and liquid developer (2012-12-04),
3. 8123976 - Alkaline aqueous solution composition used for washing or etching substrates (2012-02-28),
4. 7943516 - Manufacturing method for semiconductor device (2011-05-17),
5. 7896970 - Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process (2011-03-01),
6. 7816313 - Photoresist residue remover composition and semiconductor circuit element production process employing the same (2010-10-19),
7. 7563754 - Composition for removing photoresist residue and polymer residue (2009-07-21),
8. 7507350 - Etching liquid composition (2009-03-24),
9. 7503982 - Method for cleaning semiconductor substrate (2009-03-17),
10. 7368064 - Cleaning solution and manufacturing method for semiconductor device (2008-05-06),
11. 7138362 - Washing liquid composition for semiconductor substrate (2006-11-21),
12. 7087562 - Post-CMP washing liquid composition (2006-08-08),
13. 7084097 - Cleaning solution for substrates of electronic materials (2006-08-01),
14. 7073518 - Cleaning solution and cleaning method for mask used in vacuum vapor deposition step in production of low molecular weight organic EL device (2006-07-11),
15. 6914039 - Etching liquid composition (2005-07-05),

Title: The Innovative Journey of Norio Ishikawa

Introduction: Norio Ishikawa, a pioneering inventor hailing from Saitama, Japan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Ishikawa's latest patents showcase his commitment to pushing the boundaries of technology and include advancements in robotics, artificial intelligence, and sustainable energy solutions.

Career Highlights: With a career spanning over two decades, Ishikawa has established himself as a leading figure in the tech industry. His work has been instrumental in shaping the future of various sectors, from healthcare to transportation.

Collaborations: Throughout his career, Ishikawa has collaborated with top research institutions, universities, and leading tech companies to bring his inventions to life. His ability to work across disciplines has led to the development of cutting-edge technologies.

Conclusion: Norio Ishikawa's relentless pursuit of innovation and his passion for creating a better future through technology make him a true visionary in the world of inventions. His impact will continue to inspire generations of inventors to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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