The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2006
Filed:
May. 09, 2003
Yumiko Abe, Soka, JP;
Takuo Oowada, Soka, JP;
Norio Ishikawa, Kasukabe, JP;
Hidemitsu Aoki, Kanagawa, JP;
Hiroaki Tomimori, Kanagawa, JP;
Yumiko Abe, Soka, JP;
Takuo Oowada, Soka, JP;
Norio Ishikawa, Kasukabe, JP;
Hidemitsu Aoki, Kanagawa, JP;
Hiroaki Tomimori, Kanagawa, JP;
Kanto Kagaku Kabushiki Kaisha, Kanagawa, JP;
NEC Electronics Corporation, Kanagawa, JP;
Abstract
A post-CMP washing liquid composition is provided which includes one type or two or more types of aliphatic polycarboxylic acids and one type or two or more types selected from the group consisting of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose, and which has a pH of less than 3.0. This washing liquid has excellent performance in removing micro particles and metal impurities adhering to the surface of a semiconductor substrate after CMP and does not corrode a metal wiring material.