The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2011
Filed:
Aug. 16, 2007
Hiroshi Tomita, Tokyo, JP;
Yuji Yamada, Tokyo, JP;
Hiroaki Yamada, Tokyo, JP;
Norio Ishikawa, Saitama, JP;
Yumiko Abe, Saitama, JP;
Hiroshi Tomita, Tokyo, JP;
Yuji Yamada, Tokyo, JP;
Hiroaki Yamada, Tokyo, JP;
Norio Ishikawa, Saitama, JP;
Yumiko Abe, Saitama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Kanto Kagaku Labushiki Kaisha, Tokyo, JP;
Abstract
A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.