The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Apr. 08, 2008
Hiroshi Kawamoto, Kamakura, JP;
Mikie Miyasato, Yokohama, JP;
Takuo Oowada, Soka, JP;
Norio Ishikawa, Kasukabe, JP;
Hiroshi Kawamoto, Kamakura, JP;
Mikie Miyasato, Yokohama, JP;
Takuo Oowada, Soka, JP;
Norio Ishikawa, Kasukabe, JP;
Kanto Kagaku Kabushiki Kaisha, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile