The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Feb. 19, 2003
Yumiko Abe, Saitama, JP;
Norio Ishikawa, Saitama, JP;
Hidemitsu Aoki, Kanagawa, JP;
Hiroaki Tomimori, Kanagawa, JP;
Yoshiko Kasama, Kanagawa, JP;
Yumiko Abe, Saitama, JP;
Norio Ishikawa, Saitama, JP;
Hidemitsu Aoki, Kanagawa, JP;
Hiroaki Tomimori, Kanagawa, JP;
Yoshiko Kasama, Kanagawa, JP;
Kanto Kagaku Kabushiki Kaisha, Tokyo, JP;
NEC Electronics Corporation, Kanagawa, JP;
Abstract
There is provided a washing liquid composition for a semiconductor substrate having a contact angle between the surface thereof and water dropped thereon of at least 70 degrees, the washing liquid composition including an aliphatic polycarboxylic acid and a surfactant, and the washing liquid composition having a contact angle of at most 50 degrees when dropped on the semiconductor substrate. It is thereby possible to effectively remove particles and metals on the surface of a hydrophobic substrate without corroding it.