Location History:
- Kawasaki, JP (2007)
- Kanagawa, JP (2004 - 2012)
Company Filing History:
4 out of 2,467 
1 out of 6 
1 out of 101 
Years Active: 2004-2012
Title: The Innovative Journey of Yoshiko Kasama
Introduction
Yoshiko Kasama, a prominent inventor based in Kanagawa, Japan, has made significant contributions to the field of semiconductor technology. With a total of six patents to her name, her innovative approaches and techniques continue to influence the industry.
Latest Patents
Kasama's latest inventions include two notable patents. The first patent is titled "Method of Manufacturing a Semiconductor Device," which outlines a process that utilizes dry etching to remove an insulating layer and partially expose a Ni-containing silicide layer. This method also involves a cleaning process using reduced water with a reductive function on the exposed areas of the silicide layer. The second patent, "Cleaning Solution for Semiconductor Substrates," describes a unique cleaning solution composed of a nonionic surface active agent combined with a chelating agent and a chelating accelerator, targeted specifically for semiconductor substrates. The formulations in this patent are distinguished by their specific chemical structures and properties.
Career Highlights
Throughout her career, Yoshiko Kasama has worked at notable companies including NEC Electronics Corporation and Kanto Chemical Co., Inc. Her expertise in semiconductor manufacturing and cleaning solutions has established her as a valuable asset within the technology sector.
Collaborations
Kasama has collaborated with esteemed colleagues, such as Hidemitsu Aoki and Hiroaki Tomimori. Their collective efforts have contributed to the advancement of semiconductor technology and the development of patented solutions that streamline manufacturing processes.
Conclusion
Yoshiko Kasama's work exemplifies the spirit of innovation in the semiconductor industry. With her substantial portfolio of patents and impactful collaborations, she continues to be a leading figure in developing cutting-edge technologies that pave the way for future advancements. Her contributions not only enhance manufacturing techniques but also set new standards in the way semiconductor devices are produced and maintained.