The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2005
Filed:
Jul. 09, 2003
Hidemitsu Aoki, Kanagawa, JP;
Kenichi Tokioka, Kanagawa, JP;
Yoshiko Kasama, Kanagawa, JP;
Tatsuya Koito, Kanagawa, JP;
Keiji Hirano, Kanagawa, JP;
Hidemitsu Aoki, Kanagawa, JP;
Kenichi Tokioka, Kanagawa, JP;
Yoshiko Kasama, Kanagawa, JP;
Tatsuya Koito, Kanagawa, JP;
Keiji Hirano, Kanagawa, JP;
NEC Electronics Corporation, Kanagawa, JP;
Abstract
According to this invention, residues generated after selectively removing a low-dielectric-constant film such as SiOC can be effectively removed without damage on an insulating film or metal film. Specifically, residuesandgenerated after forming an interconnect trench in an SiOC filmare removed using a fluoride-free weak alkaline amine stripper. After the removing step, the wafer is rinsed with isopropyl alcohol and then dried without drying with pure water.