Nitesh Pandey

USPTO Granted Patents = 52 (Patent Applications = 3)

Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 62(Granted Patents)

DiyaCoin

= 0.13

Company Filing History:

52 out of 4,883

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2017-2025

where 'Filed Patents' based on already Granted Patents

52 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12366811 - Metrology system and method for determining a characteristic of one or more structures on a substrate (2025-07-22),

2. 12276784 - Micromirror arrays (2025-04-14),

3. 12259546 - Micromirror arrays (2025-03-25),

4. 12164233 - Metrology method and apparatus for of determining a complex-valued field (2024-12-10),

5. 12086973 - Detection apparatus for simultaneous acquisition of multiple diverse images of an object (2024-09-10),

6. 12007700 - Metrology system and method for determining a characteristic of one or more structures on a substrate (2024-06-11),

7. 11940739 - Metrology apparatus (2024-03-26),

8. 11927891 - Apparatus and methods for determining the position of a target structure on a substrate (2024-03-12),

9. 11782351 - Metrology device and detection apparatus therefor (2023-10-10),

10. 11675276 - Metrology apparatus and photonic crystal fiber (2023-06-13),

11. 11549806 - Metrology apparatus (2023-01-10),

12. 11536654 - Scatterometer and method of scatterometry using acoustic radiation (2022-12-27),

13. 11454887 - Metrology apparatus and method for determining a characteristic of one or more structures on a substrate (2022-09-27),

14. 11415900 - Metrology system and method for determining a characteristic of one or more structures on a substrate (2022-08-16),

15. 11385553 - Metrology method, patterning device, apparatus and computer program (2022-07-12),

Title: Nitesh Pandey: Pioneering Innovations in Metrology Technology

Introduction:

Nitesh Pandey, a visionary inventor based in Eindhoven, NL, has established himself as a trailblazer in the field of metrology technology. With an impressive portfolio of 47 patents, Pandey's unwavering dedication to innovation and pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Latest Patents:

Among his latest patents is the "Metrology system and method for determining a characteristic of one or more structures on a substrate." This cutting-edge system allows for the precise determination of characteristics of structures on a substrate by computationally analyzing scattered radiation. Additionally, Pandey invented a "Metrology apparatus" that accurately determines parameters of interest in fabricated structures on a substrate, utilizing advanced optical systems.

Career Highlights:

Throughout his illustrious career, Nitesh Pandey has made significant contributions to the field of metrology technology. Notably, he has worked with renowned companies such as ASML Netherlands B.V. and ASML Holding N.V., where his innovative solutions have pushed the boundaries of technological advancement.

Collaborations:

Collaborating with esteemed colleagues such as Arie Jeffrey Den Boef and Armand Eugene Albert Koolen, Pandey has leveraged his expertise to develop cutting-edge metrology tools. His collaborative efforts have resulted in groundbreaking inventions that have revolutionized the industry and set new benchmarks for accuracy and precision.

Conclusion:

In conclusion, Nitesh Pandey's remarkable journey as an inventor underscores his commitment to driving innovation and shaping the future of technology. His pioneering work in metrology technology has not only earned him widespread acclaim but has also paved the way for transformative advancements in the field. As a visionary inventor, Pandey's legacy continues to inspire inventors worldwide to push the boundaries of what is possible in the realm of technological innovation.

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3 patents pending:

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