The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Aug. 04, 2020
Applicants:

Asml Netherlands B.v., Veldhoven, NL;

Imec V.z.w., Leuven, BE;

Inventors:

Luc Roger Simonne Haspeslagh, Linden, BE;

Veronique Rochus, Leuven, BE;

Guilherme Brondani Torri, Leuven, BE;

Nitesh Pandey, Eindhoven, NL;

Sebastianus Adrianus Goorden, Eindhoven, NL;

Assignees:

ASML Netherlands B.V., Veldhoven, NL;

IMEC v.Z.W., Leuven, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2005.12); G02B 7/18 (2020.12); G03F 7/00 (2005.12);
U.S. Cl.
CPC ...
G02B 26/0858 (2012.12); G02B 7/1815 (2012.12); G03F 7/70116 (2012.12); G03F 7/70891 (2012.12);
Abstract

A micromirror array comprises a substrate, a plurality of minors for reflecting incident light and, for each mirror () of the plurality of minors, at least one piezoelectric actuator () for displacing the minor, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars () connecting the minor to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.


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