The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
Sep. 16, 2020
Asml Netherlands B.v., Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Nitesh Pandey, Eindhoven, NL;
Vasco Tomas Tenner, Amsterdam, NL;
Willem Marie Julia Marcel Coene, Geldrop, NL;
Patrick Warnaar, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.