The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2023
Filed:
Aug. 14, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventor:
Nitesh Pandey, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01N 21/47 (2006.01); G01N 21/956 (2006.01); G03F 7/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01N 21/4788 (2013.01); G01N 21/95607 (2013.01); G03F 7/70633 (2013.01); G02B 6/0008 (2013.01);
Abstract
A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.