Naoyuki Ueda

This inventor holds 57 USPTO granted patents and 8 published patent applications and 21 EPO patents, primarily in Field-Effect Transistors (CPC class H01L). Top assignees: Ricoh Company, Ltd., Sony Corporation, Sijtechnology, Inc.. Active years: 2004-2024.

USPTO Granted Patents = 57 (Patent Applications = 8)

% Patents Active = 77.2

EPO Patents = 21 (Patent Applications = 13)

Average Co-Inventor Count = 6.5

ph-index = 7

Forward Citations = 189(Granted Patents)

Forward Citations (Not Self Cited) = 91(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

where one patent can have more than one assignee

Years Active: 2004-2024

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Areas of Expertise:

Field-Effect Transistor

Display Element

Image Display Device

Oxide Semiconductor

Coating Liquid

Insulating Layer

Sputtering Target

Semiconductor Device

Electroconductive Thin Film

P-Type Oxide

Composite Protective Layer

Gas Barrier Laminate

57 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11908945 - Coating liquid for forming n-type oxide semiconductor film, method for producing n-type oxide semiconductor film, and method for producing field-effect transistor (2024-02-20),

2. 11901431 - Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system (2024-02-13),

3. 11876137 - Field-effect transistor including a metal oxide composite protective layer, and display element, image display device, and system including the field-effect transistor (2024-01-16),

4. 11502203 - Coating liquid for forming metal oxide film, oxide film, field-effect transistor, and method for producing the same (2022-11-15),

5. 11462646 - Field-effect transistor, display element, image display device, and system (2022-10-04),

6. 11374054 - Inorganic el element, display element, image display device, and system (2022-06-28),

7. 11342447 - Sputtering target for insulating oxide film, method for forming insulating oxide film, and method for producing field-effect transistor (2022-05-24),

8. 11315961 - Field-effect transistor, method for producing same, display element, display device, and system (2022-04-26),

9. 11271085 - Field-effect transistor having amorphous composite metal oxide insulation film, semiconductor memory, display element, image display device, and system (2022-03-08),

10. 11069780 - Coating liquid for forming oxide, method for producing oxide film, and method for producing field-effect transistor (2021-07-20),

11. 11049951 - Coating liquid for forming oxide or oxynitride insulator film, oxide or oxynitride insulator film, field-effect transistor, and method for producing the same (2021-06-29),

12. 11018262 - Field-effect transistor, method for producing the same, display element, image display device, and system (2021-05-25),

13. 10923569 - P-type oxide, p-type oxide-producing composition, method for producing p-type oxide, semiconductor device, display device, image display apparatus, and system (2021-02-16),

14. 10818770 - Metal oxide, field-effect transistor, and method for producing the same (2020-10-27),

15. 10818705 - Method for manufacturing a field effect transistor, method for manufacturing a volatile semiconductor memory element, method for manufacturing a non-volatile semiconductor memory element, method for manufacturing a display element, method for manufacturing an image display device, and method for manufacturing a system (2020-10-27),

Title: Naoyuki Ueda: Pioneering Inventor from Kanagawa, JP

Introduction: Naoyuki Ueda is a distinguished inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naoyuki Ueda holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Naoyuki Ueda has worked with leading research institutions and tech companies, consistently pushing the boundaries of what is possible in the realm of technological advancements.

Collaborations: Throughout his career, Naoyuki Ueda has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of innovation and creativity in all his projects.

Conclusion: Naoyuki Ueda's passion for innovation and his relentless drive to create a better future through technology make him a true pioneer in the world of inventions.