The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

Jul. 06, 2018
Applicant:

Ricoh Company, Ltd., Tokyo, JP;

Inventors:

Yuji Sone, Kanagawa, JP;

Naoyuki Ueda, Kanagawa, JP;

Yuki Nakamura, Tokyo, JP;

Yukiko Abe, Kanagawa, JP;

Assignee:

RICOH COMPANY, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 29/786 (2006.01); H01L 29/788 (2006.01); H01L 27/12 (2006.01); H01L 29/417 (2006.01); G09G 3/20 (2006.01); G09G 3/3233 (2016.01); G09G 3/36 (2006.01); H01L 27/108 (2006.01); H01L 27/32 (2006.01); G02F 1/1368 (2006.01); G02F 1/163 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4908 (2013.01); H01L 27/124 (2013.01); H01L 27/1225 (2013.01); H01L 27/1248 (2013.01); H01L 29/41733 (2013.01); H01L 29/7869 (2013.01); H01L 29/7881 (2013.01); G02F 1/1368 (2013.01); G02F 2001/1635 (2013.01); G09G 3/20 (2013.01); G09G 3/3233 (2013.01); G09G 3/3648 (2013.01); H01L 27/10873 (2013.01); H01L 27/3248 (2013.01); H01L 27/3262 (2013.01);
Abstract

A field-effect transistor includes a substrate; a source electrode, a drain electrode, and a gate electrode that are formed on the substrate; a semiconductor layer by which a channel is formed between the source electrode and the drain electrode when a predetermined voltage is applied to the gate electrode; and a gate insulating layer provided between the gate electrode and the semiconductor layer. The gate insulating layer is formed of an amorphous composite metal oxide insulating film including one or two or more alkaline-earth metal elements and one or two or more elements selected from a group consisting of Ga, Sc, Y, and lanthanoid except Ce.


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