Koshi, Japan

Naoto Yoshitaka

USPTO Granted Patents = 16 

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 47(Granted Patents)


Location History:

  • Kikuchi-gun, JP (2009 - 2010)
  • Koshi-Machi, JP (2009 - 2012)
  • Kumamoto, JP (2016 - 2017)
  • Koshi, JP (2011 - 2018)

Company Filing History:


Years Active: 2009-2018

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16 patents (USPTO):Explore Patents

Title: Naoto Yoshitaka: Innovator in Joining and Peeling Technologies

Introduction

Naoto Yoshitaka is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of joining and peeling technologies, holding a total of 16 patents. His innovative designs have advanced the methods used in substrate processing, making him a notable figure in the industry.

Latest Patents

Yoshitaka's latest patents include a joining device and joining system. This device is designed to join substrates together using a first holding member that vacuum-sucks a first substrate, drawing and holding it on its lower surface. A second holding member, located below the first, also vacuum-sucks a second substrate, holding it on its upper surface. The design features a body portion larger than the second substrate, multiple pins for contact with the rear surface, and an outer wall to support the outer periphery of the second substrate.

Another significant patent is for a peeling device, peeling system, and peeling method. This device is intended for peeling off a substrate to be processed from a support substrate that has been bonded using adhesive. It includes a first holding unit that heats and holds the substrate to be processed, a second holding unit for the support substrate, and a moving mechanism to facilitate horizontal movement between the two units. Additionally, an inert gas supply mechanism is included to enhance the peeling process.

Career Highlights

Throughout his career, Naoto Yoshitaka has worked with notable companies such as Tokyo Electron Limited and Intel Corporation. His experience in these leading technology firms has allowed him to refine his skills and contribute to groundbreaking innovations in substrate processing.

Collaborations

Yoshitaka has collaborated with esteemed colleagues, including Norihisa Koga and Akira Nishiya. Their combined expertise has fostered an environment of innovation and creativity, leading to the development of advanced technologies in their field.

Conclusion

Naoto Yoshitaka's contributions to joining and peeling technologies have established him as a key inventor in the industry. His innovative patents and collaborations with leading companies and colleagues highlight his commitment to advancing substrate processing methods.

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