The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
Oct. 26, 2005
Norihisa Koga, Kikuchi-gun, JP;
Shinji Koga, Kikuchi-gun, JP;
Naoto Yoshitaka, Kikuchi-gun, JP;
Akira Nishiya, Kikuchi-gun, JP;
Norihisa Koga, Kikuchi-gun, JP;
Shinji Koga, Kikuchi-gun, JP;
Naoto Yoshitaka, Kikuchi-gun, JP;
Akira Nishiya, Kikuchi-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A notch or the like of a wafer is detected via a guide member by means of a CCD camera provided so that an optical axis is coaxial to an optical axis of a laser beam, and alignment of the wafer is carried out. Next, in a state in which liquid ejected from a main nozzle or sub-nozzles is guided by means of the guide member, a laser beam whose optical axis is provided to be coaxial to the optical axis of the CCD camera is irradiated via the guide member. In addition, a predetermined processing operation is carried out with respect to the surface while an irradiation position of the laser beam is moved in a horizontal direction. The wafer is then transported from a chuck to the outside, and then, a purge gas is supplied to a bottom face of the guide member, and the bottom face is dried.