Location History:
- Kumamoto-ken, JP (2002 - 2004)
- Kunamoto, JP (2004)
- Kikuyo-Machi, JP (2003 - 2011)
- Kikuchi-gun, JP (2003 - 2012)
- Koshi-Machi, JP (2009 - 2012)
- Kumamoto, JP (2003 - 2022)
- Koshi, JP (2011 - 2023)
Company Filing History:
Years Active: 2002-2025
Title: **Innovations of Norihisa Koga: A Pioneer in Substrate Imaging and Processing**
Introduction
Norihisa Koga, hailing from Kikuchi-gun, Japan, is a notable inventor with an impressive portfolio of 33 patents. His work primarily focuses on the advancements in substrate imaging and processing technologies, with significant implications in the field of lithography.
Latest Patents
Among Koga's latest innovations are the "Substrate Imaging Apparatus" and the "Substrate Processing Apparatus and Method of Processing Substrate." The substrate imaging apparatus introduces a novel design featuring a rotary holding unit that allows for the rotation of a substrate. It includes a mirror member with a reflecting surface strategically inclined to capture both first and second light through a lens via an advanced camera setup. This innovation enhances precision in imaging substrate surfaces.
The substrate processing apparatus offers a cutting-edge method for treating substrates coated with resist films for extreme ultraviolet (EUV) lithography. It incorporates a light source that irradiates the substrate with carefully controlled vacuum ultraviolet light, ensuring optimal processing conditions prior to exposure. A light amount suppressing member is integrated to modulate light exposure, which is critical for maintaining quality in lithographic applications.
Career Highlights
Norihisa Koga's innovative contributions primarily stem from his role at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing equipment sector. His work consistently emphasizes improving processes and technologies related to substrates, contributing greatly to advancements in the semiconductor industry.
Collaborations
In his professional journey, Koga has collaborated with talented colleagues such as Takahiro Kitano and Kazuhiro Takeshita. These collaborative efforts have spurred numerous advancements and breakthroughs in the field, showcasing the power of teamwork in technological innovation.
Conclusion
Norihisa Koga stands out as an influential figure in substrate imaging and processing technologies. With a remarkable number of patents to his name, his work continues to shape the landscape of semiconductor manufacturing. Through his ongoing innovations and collaborations, Koga exemplifies the spirit of invention and the importance of advancing technology for future applications.