The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Mar. 24, 2022
Tokyo Electron Limited, Tokyo, JP;
Kazuya Iwata, Koshi, JP;
Norihisa Koga, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatus includes light source configured to irradiate a substrate having thereon a resist film made of a resist material for EUV lithography with light including vacuum ultraviolet light before an exposure process, and a light amount suppressing member provided in an optical path of the light from the light source and configured to suppress an amount of the light reaching a surface of the substrate such that the light becomes weak light as a whole in an irradiation region, wherein the light including the vacuum ultraviolet light contains a continuous spectral component of at least a portion of a band contained in a wavelength of 10 nm to 200 nm.