The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Sep. 29, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/67 (2006.01); G03F 7/16 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70991 (2013.01); G03F 7/168 (2013.01); G03F 7/2022 (2013.01); G03F 7/40 (2013.01); H01L 21/027 (2013.01); H01L 21/67178 (2013.01); H01L 21/67225 (2013.01); H01L 21/67253 (2013.01); H01L 21/67248 (2013.01); H01L 22/20 (2013.01);
Abstract
An auxiliary exposure apparatus is for performing auxiliary exposure of applying light of a predetermined wavelength from a laser light source to a resist film on a wafer, separately from exposure processing of transferring a pattern of a mask to the resist film applied on the wafer. The auxiliary exposure apparatus includes a first total reflection mirror that reflects the light from the laser light source toward the wafer; and an imaging device including a light receiving part that receives light after reflected by the wafer.