The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Jul. 24, 2019
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Norihisa Koga, Koshi, JP;

Yoshitaka Konishi, Sapporo, JP;

Naruaki Iida, Koshi, JP;

Yuzo Ohishi, Koshi, JP;

Kazuhiro Takeshita, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/704 (2013.01); G03F 7/40 (2013.01); G03F 7/7055 (2013.01); G03F 7/7075 (2013.01); G03F 7/70466 (2013.01); G03F 7/70558 (2013.01); G03F 7/70725 (2013.01);
Abstract

There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.


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