The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2016

Filed:

Mar. 04, 2011
Applicants:

Osamu Hirakawa, Kumamoto, JP;

Naoto Yoshitaka, Kumamoto, JP;

Masataka Matsunaga, Kumamoto, JP;

Norihiko Okamoto, Kumamoto, JP;

Inventors:

Osamu Hirakawa, Kumamoto, JP;

Naoto Yoshitaka, Kumamoto, JP;

Masataka Matsunaga, Kumamoto, JP;

Norihiko Okamoto, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 38/10 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B32B 43/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02076 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); H01L 21/67092 (2013.01); B32B 38/10 (2013.01); B32B 43/006 (2013.01); Y10T 156/11 (2015.01); Y10T 156/1132 (2015.01); Y10T 156/1153 (2015.01); Y10T 156/1168 (2015.01); Y10T 156/19 (2015.01); Y10T 156/1911 (2015.01); Y10T 156/1944 (2015.01);
Abstract

The present invention is used for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive into the processing target substrate and the supporting substrate, and includes: a separation processing station performing predetermined processing on the processing target substrate, the supporting substrate, and the superposed substrate; a transfer-in/out station transferring the substrates into/from the separation processing station; and a transfer unit transferring the substrates between the separation processing station and the transfer-in/out station, wherein the separation processing station includes: a separation unit separating the superposed substrate into the processing target substrate and the supporting substrate; a first cleaning unit cleaning the processing target substrate separated in the separation unit; and a second cleaning unit cleaning the supporting substrate separated in the separation unit.


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