Norihiko Okamoto

Title: Norihiko Okamoto: Innovator in Coating Film Technology

Introduction

Norihiko Okamoto is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of coating film technology, holding a total of 2 patents. His innovative work focuses on improving processes related to substrate handling and separation.

Latest Patents

Okamoto's latest patents include a "Coating Film Removing Apparatus" and a "Separation System, Separation Method, Program and Computer Storage Medium." The coating film removing apparatus features a substrate holding mechanism, an end surface detection mechanism, and an end portion removing mechanism. This invention allows for the efficient removal of the end portion of the coating film applied on a substrate. The separation system is designed to separate a superposed substrate into a processing target substrate and a supporting substrate, enhancing the efficiency of substrate processing.

Career Highlights

Norihiko Okamoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at Tokyo Electron has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Okamoto has collaborated with notable colleagues, including Osamu Hirakawa and Naoto Yoshitaka. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Norihiko Okamoto's contributions to coating film technology and substrate processing are noteworthy. His patents reflect a commitment to innovation and efficiency in the industry.