The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Aug. 14, 2014
Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Taro Yamamoto, Koshi, JP;

Naoto Yoshitaka, Koshi, JP;

Shuichi Nishikido, Koshi, JP;

Yoichi Tokunaga, Koshi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B05D 3/10 (2006.01); G03F 7/16 (2006.01); H01L 21/67 (2006.01); B05D 3/06 (2006.01); B05D 5/06 (2006.01);
U.S. Cl.
CPC ...
B05D 3/105 (2013.01); B05D 3/065 (2013.01); B05D 5/06 (2013.01); G03F 7/168 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01);
Abstract

A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.


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