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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9120120 B1

PDFFull Text
Date of Patent:
Sep. 01, 2015

Filed:

Aug. 14, 2014

Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium

Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Taro Yamamoto, Koshi, JP;

Naoto Yoshitaka, Koshi, JP;

Shuichi Nishikido, Koshi, JP;

Yoichi Tokunaga, Koshi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Michael Kornakov

Assistant Examiner:

Katelyn Whatley

Int. Cl.
CPC ...
B08B 3/00 (2006.01); B05D 3/10 (2006.01); G03F 7/16 (2006.01); H01L 21/67 (2006.01); B05D 3/06 (2006.01); B05D 5/06 (2006.01);
U.S. Cl.
CPC ...
B05D 3/105 (2013.01); B05D 3/065 (2013.01); B05D 5/06 (2013.01); G03F 7/168 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01);
Abstract

A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.

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Quick Actions:

Yamamoto, Taro. (2015). Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium (U.S. Patent No. 9120120). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9120120

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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