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For the Inventor, By the Inventor

Kaohsiung, Taiwan

Ming-Chang Wen

USPTO Granted Patents = 36 

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 40(Granted Patents)


Company Filing History:

goldMedal36 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2013-2025

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36 patents (USPTO):
1. 12374542 - Cut metal gate process for reducing transistor spacing (2025-07-29),
2. 12349393 - Semiconductor device transistor having multiple channels with different widths and materials (2025-07-01),
3. 12336235 - Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the same (2025-06-17),
4. 12243782 - Local gate height tuning by CMP and dummy gate design (2025-03-04),
5. 12156394 - SRAM structure and method for forming the same (2024-11-26),
6. 12057349 - Profile control of a gap fill structure (2024-08-06),
7. 12051735 - Dielectric spacer to prevent contacting shorting (2024-07-30),
8. 12020989 - Structure for fringing capacitance control (2024-06-25),
9. 12009266 - Structure for fringing capacitance control (2024-06-11),
10. 11948842 - Etch stop layer between substrate and isolation structure (2024-04-02),
11. 11916110 - Semiconductor device having nanosheet transistor and methods of fabrication thereof (2024-02-27),
12. 11901237 - Semiconductor device having cut gate dielectric (2024-02-13),
13. 11817354 - Local gate height tuning by cmp and dummy gate design (2023-11-14),
14. 11721544 - Cut metal gate process for reducing transistor spacing (2023-08-08),
15. 11508623 - Local gate height tuning by CMP and dummy gate design (2022-11-22),

Title: The Innovative Journey of Ming-Chang Wen

Introduction: Ming-Chang Wen, a talented inventor hailing from Kaohsiung, Taiwan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Ming-Chang Wen holds several patents in the areas of electronics and telecommunications, with his most recent patent focusing on a cutting-edge communication device that revolutionizes the way we connect with one another.

Career Highlights: With a career spanning over two decades, Ming-Chang Wen has worked for various tech companies, honing his skills and expertise in research and development. His innovative mindset and dedication to pushing the boundaries of technology have led to the successful creation of numerous groundbreaking inventions.

Collaborations: Throughout his career, Ming-Chang Wen has collaborated with leading researchers, engineers, and scientists in the industry, fostering a culture of innovation and creativity. His ability to work effectively in multidisciplinary teams has resulted in the development of cutting-edge technologies that have transformed the way we live and work.

Conclusion: Ming-Chang Wen's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His contributions to the field of electronics and telecommunications continue to inspire future generations of inventors and pave the way for a more connected and technologically advanced world.

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