Nirasaki, Japan

Masahiro Ogasawara


Average Co-Inventor Count = 3.3

ph-index = 12

Forward Citations = 745(Granted Patents)


Location History:

  • Hachioji, JP (1994 - 1995)
  • Tokyo, JP (1995 - 1996)
  • Koufu, JP (1998)
  • Kofu, JP (1999)
  • Yamanashi, JP (2005 - 2007)
  • Nirasaki, JP (2007 - 2015)
  • Miyagi, JP (2016 - 2022)

Company Filing History:


Years Active: 1994-2022

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26 patents (USPTO):Explore Patents

Title: The Innovations of Masahiro Ogasawara: A Leader in Plasma Processing Technologies

Introduction

Masahiro Ogasawara, an esteemed inventor from Nirasaki, Japan, is renowned for his significant contributions to the field of plasma processing. With an impressive portfolio comprising 26 patents, Ogasawara has played a pivotal role in advancing technologies that enhance substrate processing in various applications.

Latest Patents

Ogasawara's latest innovations include two notable patents:

1. **Etching Method and Substrate Processing Apparatus** - This patent outlines a method for etching a boron film or a boron-containing film. The method involves preparing the substrate, supplying a process gas that contains chlorine gas, fluorine-containing gas, and hydrogen-containing gas, and etching the film using plasma.

2. **Annular Member, Plasma Processing Apparatus and Plasma Etching Method** - This invention introduces an annular member designed to encircle a pedestal that holds the substrate within a plasma processing apparatus. The annular member is crafted from quartz and silicon, with a silicon content ranging from 2.5% to 10% by weight.

Career Highlights

Throughout his career, Masahiro Ogasawara has made significant strides in the industry, contributing his expertise to prominent companies such as Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His work has been instrumental in pushing the boundaries of what is possible in plasma technology and processing equipment.

Collaborations

Ogasawara has also collaborated with notable professionals in the field, including Akira Koshiishi and Sungtae Lee. These partnerships have fostered innovative approaches to plasma processing, enriching the technical community and resulting in groundbreaking inventions.

Conclusion

Masahiro Ogasawara's exceptional body of work exemplifies the spirit of innovation and dedication to advancing technology. His patents continue to influence the fields of etching and plasma processing, solidifying his legacy as a leading inventor in the industry.

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