The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2014

Filed:

Aug. 10, 2011
Applicants:

Masahiro Ogasawara, Nirasaki, JP;

Yoshiyuki Kato, Nirasaki, JP;

Hideki Mizuno, Nirasaki, JP;

Yoshinobu Hayakawa, Nirasaki, JP;

Inventors:

Masahiro Ogasawara, Nirasaki, JP;

Yoshiyuki Kato, Nirasaki, JP;

Hideki Mizuno, Nirasaki, JP;

Yoshinobu Hayakawa, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H01L 21/3065 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30655 (2013.01); H01J 37/32091 (2013.01); H01J 37/32449 (2013.01); H01J 2237/3341 (2013.01);
Abstract

A method of supplying an etching gas includes: supplying a first etching gas used in an etching process into a processing container; and supplying a second etching gas used in the etching process into the processing container, in which, when the first etching gas and the second etching gas are switched therebetween, only a small amount of a gas, which is needed as an etching gas before the switching and is not needed as an etching gas after the switching, is continuously supplied into the processing container.


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