Miyagi, Japan

Hideki Mizuno

This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2007-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Mizuno. Retrieved from https://idiyas.com/inventor/hideki-mizuno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Nirasaki, JP (2007 - 2014)
  • Boise, ID (US) (2016)
  • Miyagi, JP (2020 - 2021)

Company Filing History:


Years Active: 2007-2021

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5 patents (USPTO):Explore Patents

Title: Innovator Hideki Mizuno: Pioneering Substrate Processing Techniques

Introduction: Hideki Mizuno, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of five patents, Mizuno is recognized for his innovative methods that enhance substrate processing, particularly in the etching of silicon oxide films.

Latest Patents: Among Mizuno's latest inventions is a comprehensive method of processing substrates. This technique involves a detailed process where a first substrate is divided into two regions: a first region containing a stack of a silicon oxide film and a silicon nitride film, and a second region with a single layer of a silicon oxide film. His method meticulously details the variations in flow rates of a sulfur-containing process gas, demonstrating the correlation between these flow rates and the resultant shape differences in the etched regions. Furthermore, Mizuno has developed an etching method specifically designed for silicon-containing oxide films. This process includes a dual-stage approach where an etching pattern is formed, followed by the removal of reaction products using a secondary plasma generated from a different gas.

Career Highlights: Hideki Mizuno is currently employed by Tokyo Electron Limited, a leading company in the semiconductor equipment manufacturing sector. His work focuses on advancing substrate processing technologies, which are critical for the development of cutting-edge electronic devices.

Collaborations: Throughout his career, Mizuno has collaborated with several talented individuals, including Masahiro Ogasawara and Kumiko Yamazaki. These partnerships have fostered a conducive environment for innovation, allowing for the sharing of ideas and expertise in substrate processing technologies.

Conclusion: As a distinguished inventor, Hideki Mizuno's contributions have not only advanced the field of substrate processing but also highlighted the vital role that innovations play in the ever-evolving semiconductor industry. With ongoing developments and a robust patent portfolio, Mizuno's work continues to impact the future of technology and electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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