The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2020
Filed:
Jun. 18, 2018
Tokyo Electron Limited, Tokyo, JP;
Hideki Mizuno, Miyagi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An etching method of silicon-containing oxide film is provided. The etching method includes a first step of forming an etching pattern on the silicon-containing oxide film by etching the silicon-containing oxide film using a first plasma generated from a first gas supplied to the processing vessel, according to a pattern of a mask layered on the silicon-containing oxide film, and a second step of removing a reaction product adhering to vicinity of an opening of the etching pattern and to the mask using a second plasma generated from a second gas supplied to the processing vessel, by applying a first high frequency electric power for generating plasma and a second high frequency electric power for generating bias voltage.