The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
May. 26, 2005
Akira Koshiishi, Nirasaki, JP;
Jun Hirose, Nirasaki, JP;
Masahiro Ogasawara, Nirasaki, JP;
Taichi Hirano, Nirasaki, JP;
Hiromitsu Sasaki, Kurihara-gun, JP;
Tetsuo Yoshida, Nirasaki, JP;
Michishige Saito, Nirasaka, JP;
Hiroyuki Ishihara, Nirasaki, JP;
Jun Ooyabu, Nirasaki, JP;
Kohji Numata, Kyoto, JP;
Akira Koshiishi, Nirasaki, JP;
Jun Hirose, Nirasaki, JP;
Masahiro Ogasawara, Nirasaki, JP;
Taichi Hirano, Nirasaki, JP;
Hiromitsu Sasaki, Kurihara-gun, JP;
Tetsuo Yoshida, Nirasaki, JP;
Michishige Saito, Nirasaka, JP;
Hiroyuki Ishihara, Nirasaki, JP;
Jun Ooyabu, Nirasaki, JP;
Kohji Numata, Kyoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. An upper electrode is disposed to face a target substrate placed within the process container. An electric feeder includes a first cylindrical conductive member continuously connected to the upper electrode in an annular direction. The electric feeder is configured to supply a first RF output from a first RF power supply to the upper electrode.