Kohji Numata

Title: Kohji Numata: Innovator in Plasma Processing Technology

Introduction

Kohji Numata is a distinguished inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma processing, holding a total of 3 patents. His innovative work has advanced the technology used in various applications, particularly in semiconductor manufacturing.

Latest Patents

One of his notable patents is the "Plasma processing method and apparatus." This invention involves a method that supplies a predetermined process gas into a plasma generation space where a target substrate is placed. The process gas is converted into plasma, allowing the substrate to undergo a specific plasma process. The unique aspect of this invention is the independent control of the spatial distribution of plasma density and radical density relative to the substrate, ensuring a uniform process state across the entire surface of the substrate.

Another significant patent is the "Plasma processing apparatus and method." This apparatus is designed to operate within a vacuum atmosphere and includes a process container with an upper electrode facing the target substrate. The electric feeder is equipped with a first cylindrical conductive member that connects to the upper electrode, enabling the supply of RF output from a power supply to the electrode.

Career Highlights

Kohji Numata has built a reputable career in the field of plasma processing technology. His work has been instrumental in enhancing the efficiency and effectiveness of plasma applications in various industries. He is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment sector.

Collaborations

Throughout his career, Kohji has collaborated with notable colleagues, including Akira Koshiishi and Jun Hirose. These collaborations have further enriched his work and contributed to advancements in plasma processing technologies.

Conclusion

Kohji Numata's innovative contributions to plasma processing technology have established him as a key figure in the field. His patents reflect a commitment to advancing technology and improving processes in semiconductor manufacturing. His work continues to influence the industry and inspire future innovations.