The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
May. 26, 2005
Akira Koshiishi, Nirasaki, JP;
Jun Hirose, Nirasaki, JP;
Masahiro Ogasawara, Nirasaki, JP;
Taichi Hirano, Nirasaki, JP;
Hiromitsu Sasaki, Kurihara-gun, JP;
Tetsuo Yoshida, Nirasaki, JP;
Michishige Saito, Nirasaki, JP;
Hiroyuki Ishihara, Nirasaki, JP;
Jun Ooyabu, Nirasaki, JP;
Kohji Numata, Kyoto, JP;
Akira Koshiishi, Nirasaki, JP;
Jun Hirose, Nirasaki, JP;
Masahiro Ogasawara, Nirasaki, JP;
Taichi Hirano, Nirasaki, JP;
Hiromitsu Sasaki, Kurihara-gun, JP;
Tetsuo Yoshida, Nirasaki, JP;
Michishige Saito, Nirasaki, JP;
Hiroyuki Ishihara, Nirasaki, JP;
Jun Ooyabu, Nirasaki, JP;
Kohji Numata, Kyoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. A first upper electrode is disposed to have a ring shape and to face a target substrate placed within the process container. A second upper electrode is disposed radially inside the first upper electrode and electrically insulated therefrom. A first electric feeder is configured to supply a first RF output from a first RF power supply to the first upper electrode at a first power value. A second electric feeder branches from the first electric feeder and is configured to supply the first RF output from the first RF power supply to the second upper electrode at a second power value smaller than the first power value.