Kurihara-gun, Japan

Hiromitsu Sasaki

USPTO Granted Patents = 3 

Average Co-Inventor Count = 10.0

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2009-2013

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3 patents (USPTO):Explore Patents

Title: Hiromitsu Sasaki: Innovator in Plasma Processing Technology

Introduction

Hiromitsu Sasaki is a notable inventor based in Kurihara-gun, Japan. He has made significant contributions to the field of plasma processing, holding a total of 3 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of plasma processing techniques.

Latest Patents

One of his latest patents is a plasma processing method and apparatus. This method is designed to supply a predetermined process gas into a plasma generation space where a target substrate is placed. The process gas is converted into plasma, allowing the substrate to undergo a specific plasma process. Notably, the spatial distribution of plasma density and the density of radicals in the plasma can be controlled independently, ensuring a uniform process state across the entire surface of the substrate.

Another significant patent is the plasma processing apparatus itself. This apparatus features a process container that maintains a vacuum atmosphere. An upper electrode is positioned to face the target substrate within this container. The design includes an electric feeder with a first cylindrical conductive member that connects continuously to the upper electrode. This feeder is responsible for supplying RF output from a power supply to the upper electrode, facilitating the plasma processing.

Career Highlights

Hiromitsu Sasaki has established himself as a key figure in the plasma processing industry. His innovative approaches have led to advancements that benefit various applications in technology and manufacturing. He is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing equipment sector.

Collaborations

Throughout his career, Sasaki has collaborated with esteemed colleagues, including Akira Koshiishi and Jun Hirose. These partnerships have fostered a creative environment that has contributed to the development of cutting-edge technologies in plasma processing.

Conclusion

Hiromitsu Sasaki's contributions to plasma processing technology are noteworthy and impactful. His patents reflect a deep understanding of the complexities involved in plasma generation and processing. As he continues to innovate, his work will likely influence future advancements in the field.

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