Location History:
- Nakakoma-gun, JP (2004)
- Yamanashi, JP (2006 - 2008)
- Nirasaki, JP (2009 - 2013)
Company Filing History:
5 out of 10,341 
1 out of 1 
1 out of 373 
Years Active: 2004-2013
Title: Hiroyuki Ishihara: Innovator in Plasma Processing Technology
Introduction
Hiroyuki Ishihara is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of plasma processing, holding a total of 7 patents. His innovative work has advanced the technology used in various applications, particularly in semiconductor manufacturing.
Latest Patents
One of Ishihara's latest patents is a plasma processing method and apparatus. This method is designed to supply a predetermined process gas into a plasma generation space where a target substrate is placed. The process gas is converted into plasma, allowing the substrate to undergo a specific plasma process. Notably, the spatial distribution of plasma density and the density of radicals can be controlled independently, ensuring a uniform process state across the entire surface of the substrate. Another significant patent involves a plasma processing apparatus that features a process container maintained under vacuum conditions. This apparatus includes an upper electrode facing the target substrate and an electric feeder that supplies RF output to the upper electrode.
Career Highlights
Throughout his career, Hiroyuki Ishihara has worked with notable companies, including Tokyo Electron Limited. His expertise in plasma processing has positioned him as a key figure in the development of advanced manufacturing technologies.
Collaborations
Ishihara has collaborated with esteemed colleagues such as Akira Koshiishi and Jun Hirose, contributing to the advancement of plasma processing techniques.
Conclusion
Hiroyuki Ishihara's innovative work in plasma processing technology has led to significant advancements in the field. His contributions continue to influence the industry and pave the way for future innovations.