The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Mar. 28, 2003
Hiroyuki Ishihara, Yamanashi, JP;
Youichi Araki, Yamanashi, JP;
Toshiki Takahashi, Yamanashi, JP;
Takuya Kubo, Yamanashi, JP;
Atsushi Ito, Yamanashi, JP;
Yoko Ono, Kanagawa, JP;
Hiroyuki Ishihara, Yamanashi, JP;
Youichi Araki, Yamanashi, JP;
Toshiki Takahashi, Yamanashi, JP;
Takuya Kubo, Yamanashi, JP;
Atsushi Ito, Yamanashi, JP;
Yoko Ono, Kanagawa, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing device is able to positively enhance a process-gas exhaust efficiency in a processing region and restrict plasma leaking. A processing container of a magnetron type parallel plate plasma processing device has a separator for separating the inside of the processing container into a processing region and an exhaust region. The separator has a plurality of gas passage holes to establish communication between the processing region and the exhaust region, and consists of a non-conductive member. A conductive member is disposed on a gas passage-side surface facing the gas passage holes. A voltage V is applied by a power supply to the conductive member so that the gas passage-side surface is at a potential higher than that of a processing-region surface.