The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2004
Filed:
Jan. 02, 2001
Chishio Koshimizu, Kitakoma-gun, JP;
Hiroyuki Ishihara, Nakakoma-gun, JP;
Kimihiro Higuchi, Nakakoma-gun, JP;
Koji Maruyama, Nirasaki, JP;
Other;
Abstract
An electrostatic chuck is provided on a lower electrode provided inside a processing chamber of an etching apparatus , and a conductive inner ring body and an insulating outer ring body are encompassing the outer edges of a wafer W mounted on the chuck surface. The temperatures of the wafer W and the inner and outer ring bodies and are detected by first˜third temperature sensors and . A controller controls the pressure levels of He supplied to the space between the center of the wafer W and the electrostatic chuck via first gas outlet ducts and to the space between the outer edges of the wafer W and the electrostatic chuck via second gas outlet ducts and the quantity of heat generated by a heater inside the outer ring body based upon the information on the temperatures thus detected so that the temperatures of the wafer W and the inner ring body are set roughly equal to each other.