Miyagi, Japan

Koji Maruyama

USPTO Granted Patents = 22 


Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 101(Granted Patents)


Location History:

  • Nirasaki, JP (2004 - 2011)
  • Yamanashi, JP (2014)
  • Miyagi, JP (2015 - 2023)

Company Filing History:


Years Active: 2004-2024

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22 patents (USPTO):Explore Patents

Title: The Innovations of Koji Maruyama: A Pioneer in Plasma Processing Technology

Introduction: Koji Maruyama, residing in Miyagi, Japan, is a renowned inventor with a remarkable portfolio of 22 patents. His innovative work primarily focuses on plasma processing apparatus, contributing significantly to advancements in the field of semiconductor manufacturing.

Latest Patents: Among his latest contributions, Maruyama has developed a sophisticated control method for a plasma processing apparatus that features a first electrode for placing workpieces. The method involves supplying a bias power to the first electrode, along with a source power characterized by a frequency higher than that of the bias power. This source power alternates between two states in synchronization with a specific signal based on a radio frequency of the bias power. Furthermore, he has invented a second control method that employs a first and second electrode, where a negative DC voltage is supplied to the second electrode. This method periodically adjusts voltage values within the operation cycle, optimizing the performance and efficiency of plasma processing.

Career Highlights: Maruyama has made significant strides in his career through his work with reputable companies such as Tokyo Electron Limited and Octec, Inc. His expertise in plasma technology and processing has positioned him as an influential figure in the industry, allowing him to drive innovation and enhance technological capabilities.

Collaborations: Throughout his career, Maruyama has collaborated with esteemed colleagues in the field, including Takashi Dokan and Chishio Koshimizu. These partnerships have fostered a dynamic exchange of ideas and have significantly contributed to the success of their joint endeavors in plasma processing technology.

Conclusion: Koji Maruyama's contributions to plasma processing apparatus and control methods exemplify his innovative spirit and dedication to advancing technology. With his extensive patent portfolio and collaborative efforts, he continues to be a pivotal figure in the semiconductor industry, paving the way for future advancements.

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