Laurentius Catrinus Jorritsma

This inventor holds 14 USPTO granted patents. Top assignees: Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2006-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Laurentius Catrinus Jorritsma. Retrieved from https://idiyas.com/inventor/laurentius-catrinus-jorritsma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14

% Patents Active = 50.0

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 42(Granted Patents)

Company Filing History:

14 out of 5,075

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2006-2019

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10429741 - Lithographic apparatus and a method of operating the apparatus (2019-10-01),

2. 10151984 - Lithographic apparatus and a method of operating the apparatus (2018-12-11),

3. 9176371 - Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure (2015-11-03),

4. 7924406 - Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels (2011-04-12),

5. 7903234 - Lithographic apparatus, device manufacturing method and computer program product (2011-03-08),

6. 7724351 - Lithographic apparatus, device manufacturing method and exchangeable optical element (2010-05-25),

7. 7671968 - Lithographic apparatus having masking parts and device manufacturing method (2010-03-02),

8. 7580113 - Method of reducing a wave front aberration, and computer program product (2009-08-25),

9. 7538952 - Lithographic apparatus, aberration correction device and device manufacturing method (2009-05-26),

10. 7372633 - Lithographic apparatus, aberration correction device and device manufacturing method (2008-05-13),

11. 7332733 - System and method to correct for field curvature of multi lens array (2008-02-19),

12. 7239373 - Lithographic apparatus and device manufacturing method (2007-07-03),

13. 7221430 - Lithographic apparatus and device manufacturing method (2007-05-22),

14. 7126672 - Lithographic apparatus and device manufacturing method (2006-10-24),

Sure, here is the requested article:

Title: The Innovator: Laurentius Catrinus Jorritsma

Introduction

Laurentius Catrinus Jorritsma, a creative mind in the field of innovations, hails from Helmond, Netherlands. With a remarkable journey in the world of patents, Jorritsma has made significant contributions to the field of lithographic apparatus technology.

Latest Patents

Jorritsma's latest patents showcase his expertise in developing advanced lithographic apparatus and methods for operating them. One of his notable patents involves a sophisticated liquid confinement structure to confine immersion liquid within the apparatus, thereby enhancing precision and performance.

Career Highlights

Having accumulated a total of 14 patents, Jorritsma has a proven track record of pioneering inventions in the realm of lithographic technology. His dedication to innovation has revolutionized the industry and opened new avenues for technological advancements.

Collaborations

Throughout his career, Jorritsma has collaborated with esteemed companies such as ASML Netherlands B.V. and Carl-Zeiss-SMT AG. His partnerships with industry leaders reflect his commitment to pushing boundaries and exploring new frontiers in technology. Working alongside coworkers like Erik Roelof Loopstra and Tammo Uitterdijk, Jorritsma has fostered a culture of innovation and excellence.

Conclusion

In conclusion, Laurentius Catrinus Jorritsma stands as a beacon of innovation in the field of lithographic apparatus. His prolific career, marked by groundbreaking patents and fruitful collaborations, serves as a testament to his profound impact on the industry. Jorritsma's legacy as an inventor continues to inspire future generations to push the boundaries of technological advancement.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]