The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Jul. 14, 2006
Erik Roelof Loopstra, Heeze, NL;
Arno Jan Bleeker, Westerhoven, NL;
Heine Melle Mulder, Veldhoven, NL;
Oscar Franciscus Jozephus Noordman, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Mark Trentelman, Heeswijk-Dinther, NL;
Gerrit Streutker, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Arno Jan Bleeker, Westerhoven, NL;
Heine Melle Mulder, Veldhoven, NL;
Oscar Franciscus Jozephus Noordman, Eindhoven, NL;
Timotheus Franciscus Sengers, s-Hertogenbosch, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Mark Trentelman, Heeswijk-Dinther, NL;
Gerrit Streutker, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.