The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Oct. 05, 2005
Applicants:
Laurentius Catrinus Jorritsma, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Inventors:
Laurentius Catrinus Jorritsma, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/86 (2006.01); G03B 27/52 (2006.01); G03B 27/72 (2006.01); G03B 27/32 (2006.01); G01J 3/28 (2006.01); G01B 11/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, this can be used when an array of focusing elements is used in a projection system of a lithography system.