The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Jun. 23, 2006
Wim Tjibbo Tel, Helmond, NL;
Freerk Adriaan Stoffels, Eindhoven, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Tammo Uitterdijk, De Bilt, NL;
Johannes Wilhelmus DE Klerk, Eindhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Freerk Adriaan Stoffels, Eindhoven, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Tammo Uitterdijk, De Bilt, NL;
Johannes Wilhelmus De Klerk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.