The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Oct. 30, 2015
Asml Netherlands B.v., Veldhoven, NL;
Jeroen Peter Johannes Bruijstens, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Siebe Landheer, Eindhoven, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Arnout Johannes Meester, Eindhoven, NL;
Bauke Jansen, Duerne, NL;
Ivo Adam Johannes Thomas, Son, NL;
Marcio Alexandre Cano Miranda, Eindhoven, NL;
Maurice Martinus Johannes Van Der Lee, Eindhoven, NL;
Gheorghe Tanasa, Eindhoven, NL;
Lambertus Dominicus Noordam, Overveen, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.