Eindhoven, Netherlands

Maurice Martinus Johannes Van Der Lee


Average Co-Inventor Count = 12.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2019

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5 patents (USPTO):Explore Patents

Title: Innovation Spotlight: Maurice Martinus Johannes Van Der Lee in the World of Lithographic Apparatus

Introduction:

Maurice Martinus Johannes Van Der Lee is a notable inventor hailing from Eindhoven, Netherlands, with a remarkable portfolio of 5 patents to his name. His inventive contributions have significantly impacted the field of lithographic apparatus, particularly in the development of methods to enhance operational efficiency and optimize performance.

Latest Patents:

1. Lithographic apparatus and a method of operating the apparatus: Van Der Lee's innovative lithographic apparatus incorporates a projection system and a liquid confinement structure to confine immersion liquid within the immersion space, thus improving overall system stability and image quality. Measures are implemented to mitigate droplet-related issues and enhance final element performance.

2. Lithographic apparatus and a method of operating the apparatus: Another groundbreaking patent by Van Der Lee introduces a cleaning station within the lithographic projection apparatus, featuring various embodiments to prevent cleaning fluid contact with the final projection element and reduce foaming. The patent also highlights the use of a thermally isolated island to optimize cleaning processes.

Career Highlights:

Van Der Lee is a valued member of ASML Netherlands B.V., a prominent company at the forefront of technological innovation. His expertise and inventive spirit have been instrumental in driving advancements in lithographic technology, positioning him as a key figure in the industry's ongoing evolution.

Collaborations:

Throughout his career, Van Der Lee has collaborated closely with accomplished peers such as Hans Jansen and Gheorghe Tanasa. By working alongside these talented individuals, he has synergized efforts, shared insights, and collectively pushed the boundaries of innovation in lithographic apparatus design.

Conclusion:

In conclusion, Maurice Martinus Johannes Van Der Lee stands out as a visionary inventor whose pioneering work in lithographic apparatus has reshaped the landscape of modern technology. His patents not only demonstrate technical prowess but also reflect a deep commitment to advancing quality, efficiency, and reliability in the field. As he continues to drive innovation forward, Van Der Lee's contributions are sure to leave a lasting impact on the industry for years to come.

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