The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2011
Filed:
Nov. 21, 2007
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Erik Roelof Loopstra, Heeze, NL;
Heine Melle Mulder, Veldhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Freerk Adriaan Stoffels, Veldhoven, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Reiner Maria Jungblut, Eindhoven, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Erik Roelof Loopstra, Heeze, NL;
Heine Melle Mulder, Veldhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Freerk Adriaan Stoffels, Veldhoven, NL;
Laurentius Catrinus Jorritsma, Helmond, NL;
Reiner Maria Jungblut, Eindhoven, NL;
ASML Netherlands B.V., , NL;
Abstract
In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.