Laura M Matz

Title: Innovations and Contributions of Laura M Matz

Introduction

Laura M Matz is a prominent inventor based in Allentown, PA (US), known for her significant contributions to the field of chemical engineering and materials science. With a total of 12 patents to her name, she has made remarkable advancements in chemical mechanical planarization (CMP) and photoresist cleaning compositions.

Latest Patents

One of her latest patents focuses on a Chemical Mechanical Planarization (CMP) composition and methods for copper and through-silica via (TSV) applications. This innovation provides CMP formulations that offer high and tunable copper removal rates while minimizing copper dishing for advanced node copper or TSV applications. The CMP compositions demonstrate high selectivity of copper film compared to other barrier layers, such as tantalum (Ta), tantalum nitride (TaN), titanium (Ti), and titanium nitride (TiN), as well as dielectric films like TEOS, low-k, and ultra low-k films. The formulations include solvents, abrasives, and at least three chelators from a specific group, ensuring effective performance.

Another notable patent involves a photoresist cleaning composition used in photolithography. This composition is designed for stripping a photoresist pattern with a film thickness ranging from 3 to 150 micrometers. It comprises quaternary ammonium hydroxide, a mixture of water-soluble organic solvents, at least one corrosion inhibitor, and water, along with a method for treating substrates effectively.

Career Highlights

Laura has worked with reputable companies such as Air Products and Chemicals, Inc. and Intermolecular, Inc., where she has honed her expertise in chemical processes and materials development. Her work has significantly impacted the semiconductor industry, particularly in enhancing the efficiency of manufacturing processes.

Collaborations

Throughout her career, Laura has collaborated with notable professionals, including Raymond Nicholas Vrtis and Mark Leonard O'Neill. These collaborations have contributed to her innovative research and development efforts.

Conclusion

Laura M Matz is a distinguished inventor whose work in chemical mechanical planarization and photoresist cleaning compositions has advanced the field of materials science. Her contributions continue to influence the semiconductor industry and inspire future innovations.